Display device including main light blocking portion and spacers

ABSTRACT

A display device includes a first substrate and a second substrate facing each other, a first thin film transistor (“TFT”) disposed on the first substrate, a second TFT disposed on the first substrate, a first color filter disposed on the first TFT and a periphery thereof, a second color filter disposed on the second TFT and a periphery thereof and representing a different color from the first color filter, and a light blocking member disposed on the first and second color filters where the light blocking member includes a first spacer disposed on the first TFT and the first color filter, a second spacer disposed on the second TFT and the second color filter, a main light blocking portion disposed in peripheries of the first and second spacers, and a furrow disposed between the second spacer and the main light blocking portion.

This application claims priority to Korean Patent Application No.10-2014-0184624 filed on Dec. 19, 2014, and all the benefits accruingtherefrom under 35 U.S.C. §119, the entire contents of which areincorporated herein by reference.

BACKGROUND

(a) Field

The invention relates to a display device and a manufacturing methodthereof, and more particularly, to a display device in which a lightblocking member and thin film transistors are disposed on the samesubstrate, and a manufacturing method thereof.

(b) Description of the Related Art

A display device such as a liquid crystal display (“LCD”), an organiclight emitting diode (“OLED”) display, or the like generally includes adisplay panel including a plurality of pixels including switchingelements and a plurality of signal lines, and a driving unit.

As one of the most widely used displays at present, the LCD includes atleast one display panel formed with field generating electrodes and aliquid crystal layer.

The LCD may display a desired image by applying a voltage to the fieldgenerating electrodes, realigning liquid crystal molecules of the liquidcrystal layer, and controlling an amount of transmitted light.

When the LCD includes two display panels, the field generatingelectrodes may be respectively provided in the two display panels facingeach other, or the two field generating electrodes may be disposed inone display panel.

A pixel electrode of the field generating electrodes to which a datavoltage is applied and a plurality of thin film transistors (“TFTs”) maybe arranged in a matrix form in one of the display panels facing eachother, a color filter for representing primary colors such as red,green, and blue, for example, and a light blocking member for preventinglight leakage between pixels may be formed in the other display panel.

However, in the liquid crystal display described above, since the pixelelectrode, the TFTs, and the color filter or the light blocking memberare formed in the different display panels, it is difficult to make anaccurate alignment between the pixel electrode and the color filter orbetween the pixel electrode and the light blocking member, therebycausing an alignment error.

To solve the problem, a structure for forming the light blocking memberin the same display panel as the pixel electrode and the TFT has beenproposed, and in this case, the color filter may be formed in the samedisplay panel as the pixel electrode.

As such, the light blocking member may be integrally formed in thedisplay panel in which the pixel electrode and the TFT are formed,thereby achieving a high aperture ratio and high transmittance of theliquid crystal display.

When including the two display panels, the LCD may include a pluralityof spacers for maintaining a cell gap between the two display panels.

The plurality of spacers includes a main spacer and a sub-spacer havinga height lower than that of the main spacer.

When an external pressure is applied to the LCD to cause a change of thecell gap between the two display panels, the sub-spacer may serve tomaintain the cell gap between the two display panels and to preventdeformation of the main spacer to an extent that does not allow it to berestored to its original shape.

SUMMARY

Color filters included in the liquid crystal display may include organicmaterials for representing various primary colors. The color filters mayhave different planarization characteristics according to kinds ofprimary colors. Thus, depending on the primary colors, heights of uppersurfaces of the color filters may be changed according to planarizationcharacteristics of lower parts of the different color filters.

When spacers are disposed on the color filters that have the differentheights according to the different primary colors, differences in theheights of the spacers disposed in pixels for representing the differentprimary colors are great, and therefore a sub-spacer needs to beprovided depending on the primary colors.

If masks having different transmittances are used for pixels havingdifferent heights of the upper surfaces of the different color filtersto make the heights of the upper surface identical to each other, thisnot only makes manufacturing the masks difficult but also increases amanufacturing cost, thereby deteriorating product price competitiveness.

The invention has been made in an effort to easily form sub-spacers bysimilarly adjusting heights of the upper surfaces of the sub-spacersdisposed in the pixels for representing the different colorssubstantially without increasing the manufacturing cost.

Further, the invention has been made in an effort to reduce smudgesoccurring due to external pressure by increasing an area ratio of thesub-spacer.

A display device according to an exemplary embodiment of the inventionincludes a first substrate and a second substrate facing each other, afirst thin film transistor (“TFT”) disposed on the first substrate, asecond TFT disposed on the first substrate, a first color filterdisposed on the first TFT and a periphery of the first TFT, a secondcolor filter disposed on the second TFT and a periphery of the secondTFT and representing a different color from that of the first colorfilter, and a light blocking member disposed on the first and secondcolor filters. The light blocking member includes a first spacerdisposed on the first TFT and the first color filter, a second spacerdisposed on the second TFT and the second color filter, a main lightblocking portion disposed in peripheries of the first and secondspacers, and a furrow disposed between the second spacer and the mainlight blocking portion.

In an exemplary embodiment, a height from an upper surface of the mainlight blocking portion to an upper surface of the first and secondspacers may be smaller than a distance from the upper surface of themain light blocking portion to a surface of the second substrate.

In an exemplary embodiment, the furrow may be disposed along an edge ofthe second spacer.

In an exemplary embodiment, the furrow may include a closed curve.

In an exemplary embodiment, the furrow may have a width of about 1micrometer (μm) to about 2 μm.

In an exemplary embodiment, the furrow may have a depth of about 0.1 μmto about 0.3 μm from the upper surface of the main light blockingportion.

In an exemplary embodiment, the second color filter disposed on thesecond TFT may have a greater thickness than that of the first colorfilter disposed on the first TFT.

In an exemplary embodiment, the light blocking member may furtherinclude a third spacer that is disposed both on the periphery of thesecond TFT and on the second color filter and is connected to the mainlight blocking portion, and a height from the upper surface of the mainlight blocking portion to an upper surface of the third spacer may besmaller than a distance from the upper surface of the main lightblocking portion to the surface of the second substrate.

In an exemplary embodiment, a thickness of the second color filterdisposed on the second TFT may be greater than that of the first colorfilter disposed on the first TFT.

In an exemplary embodiment, the second color filter may represent green.

In an exemplary embodiment, a first pixel electrode disposed on thefirst color filter and a second pixel electrode disposed on the secondcolor filter may be further included.

A manufacturing method of a display device according to an exemplaryembodiment of the invention includes forming first and second TFTs on asubstrate, forming a first color filter on the first TFT and a peripheryof, the first TFT, forming a second color filter on the second TFT and aperiphery of, the second TFT, and coating a light blocking materiallayer on the first and second color filters and exposing the lightblocking material layer to light using a photomask. The photomaskincludes a first halftone region corresponding to the light blockingmaterial layer disposed on the first TFT and the first color filter, asecond halftone region corresponding to the light blocking materiallayer disposed on the second TFT and the second color filter, and anopaque region provided along an edge of the second halftone region, andlight transmittance of the first halftone region is higher than that ofthe second halftone region while light transmittance of the opaqueregion is lower than that of the second halftone region.

In an exemplary embodiment, the photomask may further include a mainregion that is disposed in peripheries of the first halftone region andthe opaque region and has a same light transmittance as that of thesecond halftone region.

In an exemplary embodiment, a width of the opaque region may be about 1micrometer (μm) to about 2 μm.

In an exemplary embodiment, the opaque region may include a closedcurve.

In an exemplary embodiment, the manufacturing method may further includeforming a first spacer corresponding to the first halftone region byexposing the light blocking material layer to light using the photomask,and forming a second spacer corresponding to the second halftone regionby exposing the light blocking material layer to light using thephotomask.

In an exemplary embodiment, the manufacturing method may further includeforming a main light blocking portion corresponding to the main regionby exposing the light blocking material layer to light using thephotomask, and forming a furrow corresponding to the opaque region anddisposed between the second spacer and the main light blocking portion.

In an exemplary embodiment, a thickness of the second color filterdisposed on the second TFT may be greater than that of the first colorfilter disposed on the first TFT.

In an exemplary embodiment, the manufacturing method may further includeforming a third TFT on the substrate, forming a third color filter onthe third TFT and a periphery of the third TFT, and coating the lightblocking material layer on the third color filter and exposing the lightblocking material layer to light using the photomask. The photomask mayfurther include a transparent region corresponding to the light blockingmaterial layer disposed on the third TFT and the third color filter, andlight transmittance of the transparent region may be higher than that ofthe first halftone region.

In an exemplary embodiment, the manufacturing method may further includeforming a third spacer corresponding to the transparent region byexposing the light blocking material layer to the light using thephotomask.

According to the exemplary embodiment of the invention, heights of theupper surfaces of the sub-spacers disposed in the pixels forrepresenting the different colors may be substantially similarlyadjusted, thereby easily forming the sub-spacers without increasing themanufacturing cost.

In addition, the area ratio of the sub-spacer may be increased to reducethe smudges that may occur due to the external pressure.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other exemplary embodiments, advantages and features ofthis invention will become more apparent by describing in further detailexemplary embodiments thereof with reference to the accompanyingdrawings, in which:

FIG. 1 is a schematic plan view of an exemplary embodiment of a displaydevice according to the invention,

FIG. 2 is a schematic plan view of the exemplary embodiment of one pixelof the display device according to the invention,

FIG. 3 is a plan view of one pixel of the display device according tothe exemplary embodiment of the invention,

FIG. 4 is a cross-sectional view of the display device illustrated inFIG. 3 taken along line IV-IV,

FIG. 5 is a cross-sectional view of the display device illustrated inFIG. 3 taken along line V-V,

FIG. 6 is a plan view of the exemplary embodiment of one pixel of thedisplay device according to the invention,

FIG. 7 is a cross-sectional view of the display device illustrated inFIG. 6 taken along line VII-VII,

FIG. 8 is a cross-sectional view of the display device illustrated inFIG. 6 taken along line VIII-VIII,

FIG. 9 is a plan view of the exemplary embodiment of one pixel of thedisplay device according to the invention,

FIG. 10 is a cross-sectional view of the display device illustrated inFIG. 9 taken along line X-X,

FIG. 11 is a cross-sectional view of the display device illustrated inFIG. 9 taken along line XI-XI,

FIG. 12 is a drawing for illustrating a plan view of an exemplaryembodiment of a photomask for forming spacers of a display device, and aschematic cross-sectional view of an exemplary embodiment of the spacerscorresponding thereto according to the invention,

FIG. 13 is a photograph for the exemplary embodiment of measuring aheight of an upper surface of a lower panel of the display deviceaccording to the invention, and

FIG. 14 is a graph for illustrating the height of the upper surface ofthe lower panel when the lower panel illustrated in FIG. 13 is takenalong line XIV-XIV.

DETAILED DESCRIPTION

The invention will be described more fully hereinafter with reference tothe accompanying drawings, in which exemplary embodiments of theinvention are shown.

As those skilled in the art would realize, the described embodiments maybe modified in various different ways, all without departing from thespirit or scope of the invention.

In the drawings, the thickness of layers, films, panels, regions, etc.are exaggerated for clarity.

Like reference numerals designate like elements throughout thespecification.

It will be understood that when an element such as a layer, film,region, or substrate is referred to as being “on” another element, itcan be directly on the other element or intervening elements may also bepresent.

In contrast, when an element is referred to as being “directly on”another element, there are no intervening elements present.

Parts that are irrelevant to the description will be omitted to clearlydescribe the invention, and the same or similar constituent elementswill be designated by the same reference numerals throughout thespecification.

Throughout this specification and the claims that follow, when it isdescribed that an element is “coupled” to another element, the elementmay be “directly coupled” to the other element or “electrically coupled”to the other element through a third element.

Further, unless explicitly described to the contrary, the word“comprise” and variations such as “comprises” or “comprising” will beunderstood to imply the inclusion of stated elements but not theexclusion of any other elements.

It will be understood that, although the terms “first,” “second,”“third” etc. may be used herein to describe various elements,components, regions, layers and/or sections, these elements, components,regions, layers and/or sections should not be limited by these terms.These terms are only used to distinguish one element, component, region,layer or section from another element, component, region, layer orsection. Thus, “a first element,” “component,” “region,” “layer” or“section” discussed below could be termed a second element, component,region, layer or section without departing from the teachings herein.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting. As used herein, thesingular forms “a,” “an,” and “the” are intended to include the pluralforms, including “at least one,” unless the content clearly indicatesotherwise. “Or” means “and/or.” As used herein, the term “and/or”includes any and all combinations of one or more of the associatedlisted items.

Furthermore, relative terms, such as “lower” or “bottom” and “upper” or“top,” may be used herein to describe one element's relationship toanother element as illustrated in the Figures. It will be understoodthat relative terms are intended to encompass different orientations ofthe device in addition to the orientation depicted in the Figures. In anexemplary embodiment, when the device in one of the figures is turnedover, elements described as being on the “lower” side of other elementswould then be oriented on “upper” sides of the other elements. Theexemplary term “lower,” can therefore, encompasses both an orientationof “lower” and “upper,” depending on the particular orientation of thefigure. Similarly, when the device in one of the figures is turned over,elements described as “below” or “beneath” other elements would then beoriented “above” the other elements. The exemplary terms “below” or“beneath” can, therefore, encompass both an orientation of above andbelow.

“About” or “approximately” as used herein is inclusive of the statedvalue and means within an acceptable range of deviation for theparticular value as determined by one of ordinary skill in the art,considering the measurement in question and the error associated withmeasurement of the particular quantity (i.e., the limitations of themeasurement system). For example, “about” can mean within one or morestandard deviations, or within ±30%, 20%, 10%, 5% of the stated value.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this invention belongs. It will befurther understood that terms, such as those defined in commonly useddictionaries, should be interpreted as having a meaning that isconsistent with their meaning in the context of the relevant art and theinvention, and will not be interpreted in an idealized or overly formalsense unless expressly so defined herein.

Exemplary embodiments are described herein with reference to crosssection illustrations that are schematic illustrations of idealizedembodiments. As such, variations from the shapes of the illustrations asa result, for example, of manufacturing techniques and/or tolerances,are to be expected. Thus, embodiments described herein should not beconstrued as limited to the particular shapes of regions as illustratedherein but are to include deviations in shapes that result, for example,from manufacturing. In an exemplary embodiment, a region illustrated ordescribed as flat may, typically, have rough and/or nonlinear features.Moreover, sharp angles that are illustrated may be rounded. Thus, theregions illustrated in the figures are schematic in nature and theirshapes are not intended to illustrate the precise shape of a region andare not intended to limit the scope of the claims.

A structure of a display device according to an exemplary embodiment ofthe invention will now be described with reference to FIGS. 1 and 2.

Referring to FIG. 1, the display device according to the exemplaryembodiment of the invention includes a display panel 300, and thedisplay panel 300 includes a plurality of signal lines and a pluralityof pixels PX that are connected thereto and arranged in an approximatematrix form.

When the display device according to the exemplary embodiment of theinvention is a liquid crystal display (“LCD”), the display panel 300 mayinclude, when viewed in a cross-section, lower and upper panels facingeach other (not shown) and a liquid crystal layer (not shown) interposedtherebetween.

The signal lines include a plurality of gate lines GL1 to GLn fortransmitting a gate signal, and a plurality of data lines DL1 to DLm fortransmitting a data voltage.

One pixel PX may include at least one switching element Q connected toat least one data line DLj (j=1, 2, . . . , m) and at least one gateline GLi (i=1, 2, . . . , n), and at least one pixel electrode (notshown) connected thereto.

The switching element Q may include at least one thin film transistor(“TFT”), and may be controlled by the gate signal transmitted throughthe gate line GLi to transmit the data voltage transmitted through thedata line DLj to the pixel electrode.

The plurality of pixels PX may include a first color pixel PX_1, asecond color pixel PX_2, and a third color pixel PX_3, each of whichrepresents different primary colors, and may further include pixels forrepresenting colors other than first to third colors or gray-basedcolors such as white and the like.

In an exemplary embodiment, the first, second, and third colors may bethree primary colors such as red, green, and blue, for example.

The first color pixel PX_1, the second color pixel PX_2, and the thirdcolor pixel PX_3 provide one dot Dot, and various colors may be realizedby controlling luminances of the pixels PX.

One dot Dot may further include pixels for representing differentcolors, as well as the first color pixel PX_1, the second color pixelPX_2, and the third color pixel PX_3.

Referring to FIG. 2, one pixel PX may include at least one lightblocking area BA and at least one of light transmitting areas OPa andOPb.

In an exemplary embodiment one pixel PX may include the first and secondlight transmitting areas OPa and OPb adjacent to each other, and thelight blocking area BA interposed therebetween, for example.

The first and second light transmitting areas OPa and OPb are areaswhere an image is normally displayed, that is, areas where light may betransmitted, and the light blocking area BA is not an area where theimage is intended to be displayed, that is, an area where the light maynot be generally transmitted.

In the display device according to the exemplary embodiment of theinvention, one pixel PX may include a plurality of subpixels.

For one image signal, different subpixels of one pixel PX may displaythe image according to different gamma curves or the same gamma curve.

Referring to FIG. 2, the first light transmitting area OPa may be thelight transmitting area of one subpixel, and the second lighttransmitting area OPb may be the light transmitting area of anothersubpixel.

The gate line GLi, the switching element Q, and the like may be disposedin the light blocking area BA.

A detailed structure of the display device according to the exemplaryembodiment of the invention will be described with reference FIGS. 3 to11 along with the aforementioned drawings.

Referring first to FIGS. 3 to 5, the first color pixel PX_1 forrepresenting the first color will be described.

FIG. 3 is a plan view of one pixel of the display device according tothe exemplary embodiment of the invention, FIG. 4 is a cross-sectionalview of the display device illustrated in FIG. 3 taken along line IV-IV,and FIG. 5 is a cross-sectional view of the display device illustratedin FIG. 3 taken along line V-V.

The display device according to the exemplary embodiment of theinvention may include lower and upper panels 100 and 200 facing eachother, and a liquid crystal layer 3 interposed between the two displaypanels 100 and 200.

The lower panel 100 will be described first. Gate conductors including aplurality of gate lines 121 and a plurality of reference voltage lines131 are disposed on a substrate 110.

Each gate line 121 mainly extends in a horizontal direction, and mayinclude a first gate electrode 124 a, a second gate electrode 124 b, anda third gate electrode 124 r that protrude in a vertical direction.

Each reference voltage line 131 may mainly extend in the horizontaldirection while being separated from the gate line 121.

The reference voltage line 131 may transmit a reference voltage that maybe an alternating current (“AC”) voltage or a constant direct current(“DC”) voltage such as a common voltage or the like.

The reference voltage line 131 may include a protruding portion 135 thatupwardly or downwardly extends from its horizontally extending portion.

A gate insulating layer 140 is disposed on the gate conductors, and asemiconductor layer including a first semiconductor 154 a, a secondsemiconductor 154 b, and a third semiconductor 154 r is disposed thegate insulating layer 140.

The first and second semiconductors 154 a and 154 b may be connected toeach other.

The first semiconductor 154 a may overlap the first gate electrode 124a, the second semiconductor 154 b may overlap the second gate electrode124 b, and the third semiconductor 154 r may overlap the third gateelectrode 124 r.

In an exemplary embodiment, the semiconductor layer may includeamorphous silicon, polycrystalline silicon, a metal oxide, or the like,for example.

A plurality of ohmic contacts 163 a, 163 b, 163 r, 165 a, 165 b, and 165r may be disposed on the semiconductor layer.

In an exemplary embodiment, the ohmic contacts 163 a, 163 b, 163 r, 165a, 165 b, and 165 r may include a silicide or a material such as n+hydrogenated amorphous silicon in which an n-type impurity is doped at ahigh concentration, for example.

In another exemplary embodiment, the ohmic contacts 163 a, 163 b, 163 r,165 a, 165 b, and 165 r may be omitted.

Data conductors including a plurality of data lines 171 including afirst source electrode 173 a and a second source electrode 173 b, afirst drain electrode 175 a, a second drain electrode 175 b, a thirdsource electrode 173 r, and a third drain electrode 175 r are disposedon the ohmic contacts 163 a, 163 b, 163 r, 165 a, 165 b, and 165 r andthe gate insulating layer 140.

Each data line 171 transmits a data signal, and mainly extends in thevertical direction to cross the gate line 121 and the reference voltageline 131.

The first source electrode 173 a protrudes from the data line 171 towardthe first gate electrode 124 a to face the first drain electrode 175 a,and the second source electrode 173 b protrudes from the data line 171toward the second gate electrode 124 b to face the second sourceelectrode 173 b.

The first and second source electrodes 173 a and 173 b are connected toeach other, and the second drain electrodes 175 b and the third sourceelectrode 173 r are connected to each other.

The third source electrode 173 r and the third drain electrode 175 rface each other.

One of end portions of the third drain electrode 175 r that does notface the third source electrode 173 r may be adjacent to or overlap someof the protruding portions 135 of the reference voltage line 131.

The first gate electrode 124 a, the first source electrode 173 a, andthe first drain electrode 175 a form a first TFT Qa along with the firstsemiconductor 154 a to serve as a first switching element, the secondgate electrode 124 b, the second source electrode 173 b, and the seconddrain electrode 175 b form a second TFT Qb along with the secondsemiconductor 154 b to serve as a second switching element, and thethird gate electrode 124 r, the third source electrode 173 r, and thethird drain electrode 175 r form a third TFT Qr along with the thirdsemiconductor 154 r to serve as a voltage-dividing switching element.

Channels of the first, second, and third TFTs Qa, Qb, and Qr aredisposed in the first, second, third semiconductors 154 a, 154 b, and154 r between the first, second, third source electrodes 173 a, 173 b,and 173 r and the first, second, third drain electrodes 175 a, 175 b,and 175 r.

The gate line 121, the reference voltage line 131, and the first tothird TFTs Qa, Qb, and Qr may be disposed in the aforementioned lightblocking area BA illustrated in FIG. 2.

The light blocking area BA included in the first color pixel PX_1 is notlimited to have the above configuration, and may be modified to havevarious configurations including at least one TFT.

A first insulating layer 180 a is disposed on the data conductors andexposed portions of the semiconductors 154 a, 154 b, and 154 r.

The first insulating layer 180 a may include an organic insulatingmaterial or an inorganic insulating material, and may include a singlelayer or multiple layers.

A first color filter 230_1 for representing the first color may bedisposed on the first insulating layer 180 a.

In an exemplary embodiment, the first color filter 230_1 may display oneof three primary colors such as red, green, and blue, or four primarycolors. However, the first color filter 230_1 is not limited to thethree primary colors of red, green, and blue, and may represent cyan,magenta, yellow, white-based colors, and the like, for example.

In the illustrated exemplary embodiment, the first color filter 230_1 isexemplarily described to represent red, for example.

The first color filter 230_1 may have a thickness T1 that variesdepending on its positions, and the variance of the thickness T1 may bedependent upon a planarization characteristic of the first color filter230_1 and a height of a lower surface thereof.

The first color filter 230_1 may be elongated along a correspondingpixel column.

Openings (not shown) that are respectively defined in a region of thefirst and second drain electrodes 175 a and 175 b may be defined in thefirst color filter 230_1.

A second insulating layer 180 b may be further disposed on the firstcolor filter 230_1.

The second insulating layer 180 b may include an inorganic insulatingmaterial or an organic insulating material.

As an overcoat for the first color filter 230_1, the second insulatinglayer 180 b may prevent the first color filter 230_1 from being exposed,and may provide a smooth surface.

The second insulating layer 180 b may prevent impurities such as apigment of the first color filter 230_1 and the like from flowing intothe liquid crystal layer 3.

In another exemplary embodiment, the second insulating layer 180 b maybe omitted.

A first contact hole 185 a for partially exposing the first drainelectrode 175 a, and a second contact hole 185 b for partially exposingthe second drain electrode 175 b may be defined in the first and secondinsulating layers 180 a and 180 b.

The first and second contact holes 185 a and 185 b may be disposedinside the openings of the first color filter 230_1.

A contact hole 181 for partially exposing both the third drain electrode175 r and the protruding portion 135 of the reference voltage line 131may be defined in the gate insulating layer 140 and the first and secondinsulating layers 180 a and 180 b.

A plurality of pixel electrodes and a plurality of contact assistants 81are disposed on the second insulating layer 180 b.

One pixel electrode may consist of one electrode, or may include aplurality of subpixel electrodes.

In the illustrated exemplary embodiment, one pixel electrode including afirst subpixel electrode 191 a and a second subpixel electrode 191 bwill be exemplarily described.

The first subpixel electrode 191 a may be substantially disposed in theaforementioned first light transmitting area OPa illustrated in FIG. 2,while the second subpixel electrode 191 b may be substantially disposedin the second light transmitting area OPb.

Referring to FIG. 3, the first and second subpixel electrodes 191 a and191 b may face each other while interposing the gate line 121, thereference voltage line 131, and the first to third TFTs Qa, Qb, and Qrtherebetween.

However, arrangement and shapes of the first and second subpixelelectrodes 191 a and 191 b are not limited to the drawings, and theshapes of the first and second subpixel electrodes 191 a and 191 b maybe modified in various ways.

In an exemplary embodiment, each of the first and second subpixelelectrodes 191 a and 191 b may have, for example, an overallquadrangular shape, for example.

Each of the first and second subpixel electrodes 191 a and 191 b mayinclude cross-shaped stem portions 195 a and 195 b including ahorizontal stem portion and a vertical stem portion, and a plurality ofminute branch portions 199 a and 199 b outwardly extending from thecross-shaped stem portions 195 a and 195 b.

The first subpixel electrode 191 a and/or the second subpixel electrode191 b may be divided into a plurality of subregions by the cross-shapedstem portions 195 a and 195 b.

In an exemplary embodiment, the minute branch portions 199 a and 199 bobliquely extend from the cross-shaped stem portions 195 a and 195 b,and may extend to form an angle of about 45 degrees (°) or about 135°with reference to the gate line 121, for example.

Directions in which the minute branch portions 199 a and 199 b of theadjacent subregions extend are different, and for example, they may beperpendicular to each other.

Each of the first and second subpixel electrodes 191 a and 191 b mayfurther include an outer stem portion (not shown) for surrounding itsouter sides.

The first and second subpixel electrodes 191 a and 191 b are physicallyand electrically connected to the first drain electrode 175 a and thesecond drain electrode 175 b through the contact holes 185 a and 185 b,respectively.

The first subpixel electrode 191 a may be applied with the data voltagefrom the drain electrode 175 a, and the second subpixel electrode 191 bmay be applied with a divided voltage between the data voltagetransmitted through the second drain electrode 175 b and the referencevoltage transmitted through the reference voltage line 131.

The third drain electrode 175 r and the protruding portion 135 of thereference voltage line 131 may be connected to each other through thecontact assistants 81 in the contact hole 181.

In an exemplary embodiment, the first subpixel electrode 191 a, thesecond subpixel electrode 191 b, and the contact assistants 81 mayinclude a transparent conductive material such as indium tin oxide(“ITO”), indium zinc oxide (“IZO”), a metal foil, etc.

Since the arrangement and shape of the pixel PX, the structure of theTFT, and the shape of the pixel electrode that are described are merelyexemplary embodiments, and may be modified in various ways.

A light blocking member 220 is disposed on the first and second subpixelelectrodes 191 a and 191 b and the contact assistants 81.

The light blocking member 220 is also referred to as a black matrix.

The light blocking member 220 disposed in the first color pixel PX_1includes a main light blocking portion 222, a first spacer 221 a, and asecond spacer 221 b.

The main light blocking portion 222 may be generally disposed in thelight blocking area BA in which the first to third TFTs Qa, Qb, and Qrare disposed, and may have an overall smooth upper surface.

The main light blocking portion 222 may prevent light leakage betweenthe first light transmitting area OPa in which the first subpixelelectrode 191 a is disposed and the second light transmitting area OPbin which the second subpixel electrode 191 b is disposed.

The main light blocking portion 222 may include a portion for coveringthe contact holes 185 a, 185 b, and 181, and the portion fills largesteps on the contact holes 185 a, 185 b, and 181 to make a smoothsurface and to prevent light leakages around the steps.

In an exemplary embodiment, a thickness of the main light blockingportion 222 may be about 1 micrometer (nm) to about 2.5 nm, and morespecifically, about 2 nm, for example.

The first and second spacers 221 a and 221 b are separated from eachother and are connected to the main light blocking portion 222.

The first and second spacers 221 a and 221 b may be disposed on thefirst to third TFTs Qa, Qb, and Qr and/or the signal lines such as thegate line 121, the reference voltage line 131, and the data line 171.

In an exemplary embodiment, the first spacer 221 a may be disposed onthe first and second TFTs Qa and Qb, the second spacer 221 b may bedisposed on a periphery of the TFT, that is, on the outside where theTFTs are not disposed, and may be disposed, for example, on the gateline 121, but the invention is not limited thereto.

The first and second spacers 221 a and 221 b may serve as sub-spacers tomaintain and support a cell gap between the upper and lower panels 200and 100 when a distance between the upper and lower panels 200 and 100of the display device is narrow due to external pressure.

In this case, heights H1 of the first and second spacers 221 a and 221 bfrom an upper surface of the main light blocking portion 222 are smallerthan a distance between the upper surface of the main light blockingportion 222 of the lower panel 100 and the upper panel 200, that is, thecell gap.

In an alternative exemplary embodiment, either one of the first spacer221 a and the second spacer 221 b may be a main spacer having an uppersurface that is higher than that of the other.

In general, the main spacer may serve to maintain and support the cellgap between the upper and lower panels 200 and 100.

When there are a large number of the main spacers, bubbles may begenerated in the liquid crystal layer 3 because adjusting the cell gapbetween the upper and lower panels 200 and 100 according to variationsin volumes of the liquid crystal layer 3 due to environmental changessuch as temperature and the like may be difficult, so the number of themain spacers may be limited.

On the contrary, when external pressure is applied to the displaydevice, the sub-spacers operate as backups for the main spacer bymaintaining the cell gap between the upper and lower panels 200 and 100,and when there are a small number of the sub-spacers and the main spaceris permanently deformed to generate display defects such as smudges, thedisplay device having an overall larger number of the sub-spacers may bemore advantageous.

In an exemplary embodiment, a height from the upper surface of the mainlight blocking portion 222 to an upper surface of the main spacer maybe, for example, about 1 μm when the thickness of the main lightblocking portion 222 is, for example, about 2 μm, and heights from theupper surface of the main light blocking portion 222 to upper surfacesof the sub-spacers may be, for example, about 0.45 μm to about 0.55 μm.

The heights of the first and second spacers 221 a and 221 b from theupper surface of the main light blocking portion 222 according to theillustrated exemplary embodiment may be, for example, about 0.45 μm toabout 0.55 μm.

However, the invention is not limited thereto, and the description willbe made based on these reference values.

In an exemplary embodiment, the widths of the first and second spacers221 a and 221 b may be about 30 μm to about 50 μm, but the widths of thefirst and second spacers 221 a and 221 b are not limited thereto.

Portions having different thicknesses such as the main light blockingportion 222, the first spacer 221 a, and the second spacer 221 b of thelight blocking member 220 may be defined using one photomask.

In this case, the photomask may include a transparent region where thelight is transmitted, an opaque region where the light is blocked, and ahalftone region where the light is partially transmitted, and thehalftone region may include a portion that corresponds to the main lightblocking portion 222.

This will be described in detail below.

The light blocking member 220 may further include a light blockingportion (not shown) for covering at least one of the gate line 121, thereference voltage line 131, and the data line 171.

Particularly, the light blocking portion overlapping the data line 171may prevent the light leakage between the pixels PX.

In an exemplary embodiment, the light blocking member 220 may include apigment such as black carbon and a photosensitive organic material.

As described in the exemplary embodiment of the invention, when thefirst color filter 230_1 and the light blocking member 220 are disposedin the lower panel 100 along with the first to third TFTs Qa, Qb, andQr, an alignment error may be reduced since it is easy to makealignments between the light blocking member 220 and between the firstcolor filter 230_1 and the pixel electrode and the TFTs Qa, Qb, and Qr.

Accordingly, the light leakage or reduction in an aperture ratio of thedisplay device due to misalignments between these components may beprevented, and transmittance may be enhanced.

An alignment layer is disposed on the light blocking member 220, and thealignment layer may be a vertical alignment layer.

The upper panel 200 will now be described. A facing electrode 270 may bedisposed on a substrate 210.

The facing electrode 270 may be provided as a whole plate to have aplanar shape on an entire surface of the substrate 210.

In an exemplary embodiment, the facing electrode 270 may transmit theconstant common voltage.

In an exemplary embodiment, the facing electrode 270 may include atransparent conductive material such as ITO, IZO, a metal foil, etc.

In an exemplary embodiment, an alignment layer is disposed on the facingelectrode 270, and the alignment layer may be a vertical alignmentlayer.

The liquid crystal layer 3 includes a plurality of liquid crystalmolecules (not shown).

The liquid crystal molecules may have negative dielectric anisotropy,and may be aligned such that they are substantially perpendicular to thesubstrates 110 and 210 while no electric field is generated in theliquid crystal layer 3.

The liquid crystal molecules may be pretilted in predetermineddirections when no electric field is generated in the liquid crystallayer 3.

In an exemplary embodiment, the liquid crystal molecules may bepretilted in directions that are substantially parallel to the minutebranch portions 199 a and 199 b of the first and second subpixelelectrodes 191 a and 191 b.

In order to maintain a charged voltage, the first subpixel electrode 191a may form a first liquid crystal capacitor along with the facingelectrode 270 while the second subpixel electrode 191 b may form asecond liquid crystal capacitor along with the facing electrode 270.

Now, referring to FIGS. 6 to 8 and comparing with the first color pixelPX_1 according to the aforementioned exemplary embodiment illustratedand described in FIGS. 3 to 5, a second color pixel PX_2 forrepresenting the second color will be described.

FIG. 6 is a plan view of one pixel of the display device according tothe exemplary embodiment of the invention, FIG. 7 is a cross-sectionalview of the display device illustrated in FIG. 6 taken along lineVII-VII, and FIG. 8 is a cross-sectional view of the display deviceillustrated in FIG. 6 taken along line VIII-VIII.

Referring to FIGS. 6 to 8, since a structure of the second color pixelPX_2 of the display device according to the exemplary embodiment of theinvention is substantially the same as the aforementioned first colorpixel PX_1, only differences therebetween will be described.

Similar to the aforementioned exemplary embodiment, the second colorpixel PX_2 may include at least one TFT such as the first to third TFTsQa, Qb, and Qr disposed on the substrate 110, and a first insulatinglayer 180 a disposed thereon.

A second color filter 230_2 may be disposed on the first insulatinglayer 180 a.

In an exemplary embodiment, the second color filter 230_2 may representone of three primary colors such as red, green, and blue or four primarycolors, or one of primary colors such as cyan, magenta, yellow, andwhite-based colors.

The second color filter 230 _(—) 2 represents a different color from thefirst color filter 230_1.

In the illustrated exemplary embodiment, the second color filter 230_2will be exemplarily described to represent green.

The second color filter 230_2 may have a thickness T2 that variesdepending on its positions, and the variance of the thickness T2 may bedependent upon a planarization characteristic of the second color filter230_2 and a height of a lower surface thereof.

Particularly, in the illustrated exemplary embodiment, the planarizationcharacteristic of the second color filter 230_2 is worse than that ofthe first color filter 230_1 in terms of characteristics of a material.

Accordingly, as illustrated in FIGS. 7 and 8, a height of an uppersurface of the second color filter 230_2 varies as a height of a lowersurface of the second color filter 230_2 varies.

In this case, a degree of variations in the thickness T2 of the secondcolor filter 230_2 according to the positions is small.

Accordingly, the upper surface of the second color filter 230_2 disposedon a multi-layered structure such as the first to third TFTs Qa, Qb, andQr for forming a high step is provided to be higher than its periphery.

In an exemplary embodiment, when the second color filter 230_2represents green, the height of the upper surface of the second colorfilter 230_2 disposed on the TFTs Qa, Qb, and Qr of the second colorpixel PX_2 may be higher by about 0.3 μm to about 0.4 μm than that ofthe upper surface of the first color filter 230_1 (See FIG. 4) disposedon the TFTs Qa, Qb, and Qr of the aforementioned first color pixel PX_1.

That is, in an exemplary embodiment, the thickness T2 of the secondcolor filter 230_2 disposed on the TFTs Qa, Qb, and Qr of the secondcolor pixel PX_2 may be greater by about 0.3 μm to about 0.4 μm than thethickness T1 of the first color filter 230_1 disposed on the TFTs Qa,Qb, and Qr of the first color pixel PX_1.

The first and second subpixel electrodes 191 a and 191 b of the secondcolor pixel PX_2 and the light blocking member 220 disposed on thecontact assistants 81 include a main light blocking portion 222, a thirdspacer 221 c, and a fourth spacer 221 d.

Since the main light blocking portion 222 disposed in the second colorpixel PX_2 is substantially the same as the main light blocking portion222 disposed in the aforementioned first color pixel PX_1 (See FIG. 4),a detailed description thereof will be omitted.

The third and fourth spacers 221 c and 221 d are separated from eachother, and are connected to the main light blocking portion 222.

The third and fourth spacers 221 c and 221 d may be disposed on thefirst to third TFTs Qa, Qb, and Qr and/or the signal lines such as thegate line 121, the reference voltage line 131, and the data line 171.

In an exemplary embodiment, the third spacer 221 c may be disposed onthe first and second TFTs Qa and Qb, and the fourth spacer 221 d may bedisposed on peripheries of the TFTs, that is, on the outside where theTFTs are not disposed, and may be disposed, for example, on the gateline 121, but the invention is not limited thereto.

The third and fourth spacers 221 c and 221 d may be the sub-spacers.

Thus, heights H2 of the third and fourth spacers 221 c and 221 d fromthe upper surface of the main light blocking portion 222 are smallerthan the distance between the upper surface of the main light blockingportion 222 of the lower panel 100 and the upper panel 200, that is, thecell gap.

In an exemplary embodiment, when the thickness of the main lightblocking portion 222 is about 2 μm, the heights from the upper surfaceof the main light blocking portion 222 to the upper surface of the thirdand fourth spacers 221 c and 221 d may be, for example, about 0.45 μm toabout 0.55 μm.

A furrow HA is disposed at edges of the third spacer 221 c that isdisposed on the TFT.

The furrow HA is provided along the edges of the third spacer 221 c,that is, a border between the third spacer 221 c and the main lightblocking portion 222, and may form a closed curve for enclosing thethird spacer 221 c.

A width Wh of the furrow HA may be about 1 μm to about 2 μm, but theinvention is not limited thereto.

In an exemplary embodiment, the depth of the furrow HA in the main lightblocking portion 222 may be about 0.1 μm to about 0.3 μm, for example,but the invention is not limited thereto.

In addition, various characteristics and effects of the aforementionedfirst color pixel PX_1 may be identically applied to the second colorpixel PX_2.

Now, referring to FIGS. 9 to 11 and comparing with the first color pixelPX_1 according to the aforementioned exemplary embodiment illustratedand described in FIGS. 3 to 5, the third color pixel PX_3 forrepresenting the third color will be described.

FIG. 9 is a plan view of one pixel of the display device according tothe exemplary embodiment of the invention, FIG. 10 is a cross-sectionalview of the display device illustrated in FIG. 9 taken along line X-X,and FIG. 11 is a cross-sectional view of the display device illustratedin FIG. 9 taken along line XI-XI.

Referring to FIGS. 9 to 11, since a structure of the third color pixelPX_3 of the display device according to the exemplary embodiment of theinvention is substantially the same as the aforementioned first colorpixel PX_1, only differences therebetween will be described.

Similar to the aforementioned exemplary embodiment, the third colorpixel PX_3 may include at least one TFT such as the first to third TFTsQa, Qb, and Qr disposed on the substrate 110, and a first insulatinglayer 180 a disposed thereon.

A third color filter 230_3 may be disposed on the first insulating layer180 a.

In an exemplary embodiment, the third color filter 230_3 may display oneof three primary colors such as red, green, and blue or four primarycolors, or one of primary colors such as cyan, magenta, yellow, andwhite-based colors.

The third color filter 230_3 represents a different color from the firstcolor filter 230_1 and the second color filter 230_2.

In the illustrated exemplary embodiment, the third color filter 230_3will be exemplarily described to represent blue.

The third color filter 230_3 may have a thickness T3 that variesdepending on its positions, and the variance of the thickness T3 variesmay be dependent upon a planarization characteristic of the third colorfilter 230_3 and a height of a lower surface thereof.

In one exemplary embodiment of the invention, the third color filter230_3 may have a better planarization characteristic of a material thanthe second color filter 230_2.

Accordingly, in the display device according to the exemplary embodimentof the invention, the planarization characteristic of the second colorfilter 230_2 is worse than those of the first and third color filters230_1 and 230_3.

When the third color filter 230_3 represents blue, the height of theupper surface of the third color filter 230_3 disposed on the TFTs Qa,Qb, and Qr of the third color pixel PX_3 may be substantially the sameas that of the upper surface of the first color filter 230_1 disposed onthe TFTs Qa, Qb, and Qr of the aforementioned first color pixel PX_1.

Thus, the height of the upper surface of the third color filter 230_3may be lower by about 0.3 μm to about 0.4 μm than that of the uppersurface of the first color filter 230_1 that is disposed on the TFTs Qa,Qb, and Qr of the first color pixel PX_1.

That is, in the exemplary embodiment, the thickness T2 of the secondcolor filter 230_2 disposed on the TFTs Qa, Qb, and Qr of the secondcolor pixel PX_2 may be greater by about 0.3 μm to about 0.4 μm than thethickness T3 of the third color filter 230_3 disposed on the TFTs Qa,Qb, and Qr of the third color pixel PX_3, for example.

The first and second subpixel electrodes 191 a and 191 b of the thirdcolor pixel PX_3 and the light blocking member 220 disposed on thecontact assistants 81 include a main light blocking portion 222, a fifthspacer 221 e, and a sixth spacer 221 f.

Since the main light blocking portion 222 disposed on the third colorpixel PX_3 is substantially the same as the main light blocking portion222 disposed in the aforementioned first color pixel PX_1, a detaileddescription thereof will be omitted.

The fifth and sixth spacers 221 e and 221 f are separated from eachother, and are connected to the main light blocking portion 222.

The fifth and sixth spacers 221 e and 221 f may be disposed on the firstto third TFTs Qa, Qb, and Qr and/or the signal lines such as the gateline 121, the reference voltage line 131, and the data line 171.

In an exemplary embodiment, the fifth spacer 221 e may be disposed onthe first and second TFTs Qa and Qb, and the sixth spacer 221 f may bedisposed on the peripheries of the TFTs, that is, on the outside wherethe TFTs are not disposed, and may be disposed, for example, on the gateline 121, but the invention is not limited thereto.

One of the fifth and sixth spacers 221 e and 221 f may be a sub-spacer,while the other may be a main spacer.

In an exemplary embodiment, the fifth spacer 221 e may be the mainspacer, while the sixth spacer 221 f may be the sub-spacer, for example.

Accordingly, a height of the fifth spacer 221 e from the upper surfaceof the main light blocking portion 222 is greater than that of the sixthspacer 221 f from the upper surface of the main light blocking portion222, and the fifth spacer 221 e may substantially contact the upperpanel 200.

In an exemplary embodiment, when the thickness of the main lightblocking portion 222 is about 2 μm, the height from the upper surface ofthe main light blocking portion 222 to the upper surface of the fifthspacer 221 e may be, for example, about 1 μm.

In this case, the height from the upper surface of the main lightblocking portion 222 to the upper surface of the sixth spacer 221 f maybe, for example, about 0.45 μm to about 0.55 μm.

Unlike as described above, both of the fifth and sixth spacers 221 e and221 f may be the sub-spacers.

In this case, at least one of the first and second spacers 221 a and 221b disposed in the first color pixel PX_1 or the fourth spacer 221 ddisposed in the second color pixel PX_2 may be the main spacer.

In addition, various characteristics and effects of the aforementionedfirst color pixel PX_1 may be identically applied to the third colorpixel PX_3.

Now, a manufacturing method of a display device according to anexemplary embodiment of the invention will be described with referenceto FIG. 12 along with the aforementioned drawings.

FIG. 12 is a drawing for illustrating a plan view of a photomask forforming spacers of a display device according to an exemplary embodimentof the invention, and a schematic cross-sectional view of the spacerscorresponding thereto.

First, a conductive material is laminated on a substrate 110 includingglass or plastic, and is then patterned to form gate conductorsincluding a plurality of gate lines 121 and a plurality of referencevoltage lines 131.

Next, an insulating material such as an inorganic insulating material oran organic insulating material is laminated on the gate conductors toform a gate insulating layer 140.

Next, a semiconductor material and a conductive material aresequentially laminated on the gate insulating layer 140 and are thenpatterned to form a semiconductor layer including a first semiconductor154 a, a second semiconductor 154 b, and a third semiconductor 154 r anddata conductors including a plurality of data lines 171, a first drainelectrode 175 a, a second drain electrode 175 b, a third sourceelectrode 173 r, and a third drain electrode 175 r.

In this case, an exposure process using a photomask including a halftonemay be used.

Next, an organic insulating material or an inorganic insulating materialis laminated on the data conductors and exposed portions of thesemiconductors 154 a, 154 b, and 154 r to form a first insulating layer180 a.

Next, a material for forming color filters is coated and is then exposedto light to form a first color filter 230_1 disposed in a first colorpixel PX_1, a second color filter 230_2 disposed in a second color pixelPX_2, and a third color filter 230_3 disposed in a third color pixelPX_3.

In this case, due to a material characteristic of the second colorfilter 230_2, a height of an upper surface of the second color filter230_2 disposed on the TFT may be higher by about 0.3 μm to about 0.4 μmthan that of an upper surface of the first color filter 230_1 or thethird color filter 230_3 that is disposed on the TFT corresponding tothe first color pixel PX_1 or the third color pixel PX_3.

Next, an insulating material is laminated on the first color filter230_1, the second color filter 230_2, and the third color filter 230_3to form a second insulating layer 180 b.

Next, the gate insulating layer 140, the first insulating layer 180 a,and the second insulating layer 180 b are patterned to form a firstcontact hole 185 a for exposing the first drain electrode 175 a, asecond contact hole 185 b for exposing the second drain electrode 175 b,and a contact hole 181 for partially exposing both the third drainelectrode 175 r and a protruding portion 135 of the reference voltageline 131.

Next, a conductive material such as ITO, IZO, or the like is laminatedand is then patterned to form a plurality of pixel electrodes and aplurality of contact assistants 81.

In an exemplary embodiment, steps of the first to third color filters230_1, 230_2, and 230_3 are transferred to the second insulating layer180 b disposed on them, and the height of the upper surface of thesecond insulating layer 180 b disposed on the TFT of the first colorpixel PX_1 may be higher by about 0.3 μm to about 0.4 μm than that ofthe upper surface of the second insulating layer 180 b disposed on theTFT corresponding to the second color pixel PX_2 or the third colorpixel PX_3.

Next, a light blocking material is coated on first and second subpixelelectrodes 191 a and 191 b and the contact assistants 81 to form a lightblocking material layer (not shown).

In an exemplary embodiment, a thickness of the light blocking materiallayer may be about 3 μm, but the invention is not limited thereto.

In this case, depending on a planarization characteristic of the lightblocking material layer, the thickness of the light blocking materiallayer disposed on the TFT of the second color pixel PX_2 and the secondcolor filter 230_2 may be smaller than that of its periphery.

In an exemplary embodiment, the thickness of the light blocking materiallayer disposed on the TFT of the second color pixel PX_2 and the secondcolor filter 230_2 may have a smaller thickness by about 10% to about20% than its periphery due to a high step of a lower surface of thelight blocking material layer.

Accordingly, in an exemplary embodiment, the height of the upper surfaceof the light blocking material layer disposed on the TFT of the secondcolor pixel PX_2 and the second color filter 230_2 may be higher by, forexample, about 0.24 μm to about 0.36 μm, more specifically, by about0.27 μm than its periphery or that of the upper surface of the lightblocking material layer disposed on the TFT and the color filters 230_1and 230_3 of the first color pixel PX_1 or the third color pixel PX_3.

Next, the light blocking material layer coated using the photomask 50 asillustrated in FIG. 12 is exposed to light to form a light blockingmember 220.

Referring to FIG. 12, the photomask 50 according to an exemplaryembodiment of the invention includes a plurality of regions havingdifferent transmittances, and the plurality of regions may represent thefour different transmittances.

The regions for representing the four transmittances may include atransparent region having the highest light transmittance, a firsthalftone region where light is partially transmitted, a second halftoneregion where the light is partially transmitted but has a differenttransmittance than the first halftone region, and an opaque regionhaving the lowest light transmittance.

In an exemplary embodiment, the transparent region may have lighttransmittance of about 100%, for example, since it transmits almost allof the light while the opaque region has light transmittance of about 0%because it blocks most of the light, light transmittance of the firsthalftone region may be, for example, about 19%, and light transmittanceof the second halftone region may be, for example, about 16%.

When a remaining portion of the light blocking material layer afterlight irradiation has a negative photosensitivity, the photomask 50corresponding to the first color pixel PX_1 may include a main region 55m, which is the second halftone region corresponding to the main lightblocking portion 222 of the aforementioned light blocking member 220, afirst halftone region 55 a corresponding to a first spacer 221 a, and afirst halftone region 55 b corresponding to a second spacer 221 b.

The photomask 50 corresponding to the second color pixel PX_2 mayinclude the main region 55 m, which is the second halftone regioncorresponding to the main light blocking portion 222, a second halftoneregion 55H corresponding to a third spacer 221 c, an opaque region 55Bprovided around the second halftone region 55H, and a first halftoneregion 55 d corresponding to a fourth spacer 221 d.

The opaque region 55B is provided to form the third spacer 221 c alongwith the second halftone region 55H, and as described above in FIG. 7,corresponds to a furrow HA provided around the third spacer 221 c.

The opaque region 55B may form a closed curve for enclosing the secondhalftone region 55H.

In an exemplary embodiment, a width of the second halftone region 55Hmay be about 30 μm to about 40 μm, for example, but the invention is notlimited thereto.

In an exemplary embodiment, a width of the opaque region 55B may beabout 1 μm to about 2 μm, more specifically, about 1.5 μm, for example,but the invention is not limited thereto.

The photomask 50 corresponding to the third color pixel PX_3 may includea main region 55 m, which is the second halftone region corresponding tothe main light blocking portion 222, a transparent region 55 ecorresponding to a fifth spacer 221 e, and a first halftone region 55 fcorresponding to a sixth spacer 221 f.

The photomask 50 corresponding to the first and second lighttransmitting areas OPa and OPb from which the light blocking area BA isexcluded may include the opaque region.

When the light blocking material layer is exposed to light and is thenprovided through the photomask 50 such that the light is irradiatedthrough the transparent region 55 e to form the fifth spacer 221 e thatis the main spacer, the light is partially transmitted (e.g., 19%)through the first halftone regions 55 a, 55 b, 55 d, and 55 f to formthe first, second, fourth and sixth spacers 221 a, 221 b, 221 d, and 221f that are sub-spacers, and the light is partially transmitted (e.g.,16%) through the main region 55 m that is the second halftone region toform a main light blocking portion 222.

Since the second halftone region 55H and the main region 55 m, which arethe second halftone regions, have the same light transmittance, a heightof the upper surface of the light blocking material layer exposed tolight through the second halftone region 55H is reduced such that it issubstantially the same as that of the light blocking material layeraround its periphery.

Accordingly, in an exemplary embodiment, the height of the lightblocking material layer exposed to light through the second halftoneregion 55H increases further by about 0.24 μm to about 0.36 μm, morespecifically, by about 0.27 μm than that of the upper surface of themain light blocking portion 222, for example.

However, the light is diffracted by the opaque region 55B for enclosingthe periphery of the second halftone region 55H such that an amount ofexposure to light increases for the inside of the opaque region 55B.

In an exemplary embodiment, the height of the upper surface of the lightblocking material layer exposed to light through the second halftoneregion 55H substantially increases further by about 0.1 μm to 0.2 μmthan that of the upper surface of the main light blocking portion 222,for example.

As a result, in an exemplary embodiment, the height of the lightblocking material layer exposed to light through the second halftoneregion 55H may be provided higher, for example, by about 0.34 μm toabout 0.56 μm than that of the upper surface of the main light blockingportion 222 around its periphery.

These values are exemplarily illustrated to have a wide range, and thelight blocking material layer exposed to light through the secondhalftone region 55H may be actually provided to be higher, for example,by about 0.4 μm to about 0.5 μm than the upper surface of the main lightblocking portion 222 around its periphery.

As such, in an exemplary embodiment, a portion provided to be higher byabout 0.34 μm to about 0.56 μm than the upper surface of the main lightblocking portion 222 forms the third spacer 221 c that is disposed onthe TFT of the aforementioned second color pixel PX_2.

When the light blocking material layer has a positive photosensitivity,transparencies of the photomask 50 described above may be inverselychanged.

When the planarization characteristic of the color filter differs fromthe planarization characteristics of the rest of the color filters, andtherefore, as shown in the exemplary embodiment of the invention, theupper surface of the second color filter 230_2 disposed on the TFT isdisposed higher than those of the upper surfaces of the first and secondcolor filters 230_1 and 230_3 that are disposed on the TFT, thesub-spacer needs to be disposed on the TFT of the second color pixelPX_2, thereby increasing a cost of the photomask since the photomask 50includes the region having different transmittance.

However, as shown in the exemplary embodiment of the invention, thephotomask 50 corresponding to the sub-spacer disposed on the TFT of thesecond color pixel PX_2 may include the second halftone region 55Hhaving the same transmittance as the main light blocking portion 222 andthe opaque region 55B for enclosing the periphery thereof, such that thethird spacer 221 c is provided in the second color pixel PX_2 withoutadding the region having additional transmittance.

Accordingly, the regions having the opaque region 55B where thesub-spacer disposed in the second color pixel PX_2 may be provided areobtained to ensure the sub-spacer's area ratio.

In addition, the number of the sub-spacers may be easily incremented toprevent display defects such as smudges of the display device due to theexternal pressure.

FIG. 13 is a photograph for measuring a height of an upper surface of alower panel of the display device according to the exemplary embodimentof the invention, and FIG. 14 is a graph for illustrating the height ofthe upper surface of the lower panel when the lower panel illustrated inFIG. 13 is taken along line XIV-XIV.

Referring to FIGS. 13 and 14, a structure of a third spacer 221 cprovided in a second color pixel PX_2 of a display device manufacturedaccording to an exemplary embodiment of the invention and a peripherythereof will be described. In an exemplary embodiment, since a mainlight blocking portion 222 is provided to have a height of about 1.9 μmand the third spacer 221 c is provided to have a height of about 2.5 μm,for example, it may be seen that the upper surface of the third spacer221 c is provided to be higher by about 0.6 μm than the upper surface ofthe main light blocking portion 222.

While this invention has been described in connection with what ispresently considered to be practical exemplary embodiments, it is to beunderstood that the invention is not limited to the disclosedembodiments, but, on the contrary, is intended to cover variousmodifications and equivalent arrangements included within the spirit andscope of the appended claims.

What is claimed is:
 1. A display device comprising: a first substrateand a second substrate facing each other; a first thin film transistordisposed on the first substrate; a second thin film transistor disposedon the first substrate; a first color filter disposed on the first thinfilm transistor and a periphery of the first thin film transistor; asecond color filter disposed on the second thin film transistor and aperiphery of the second thin film transistor and representing adifferent color from that of the first color filter; and a lightblocking member which is disposed on the first and second color filters,and includes: a first spacer disposed on the first thin film transistorand the first color filter; a second spacer disposed on the second thinfilm transistor and the second color filter; and a main light blockingportion disposed in peripheries of the first and second spacers, whereinthe main light blocking portion includes a first portion, and a secondportion which includes a furrow disposed at a boundary between thesecond spacer and the first portion of the main light blocking portion,wherein a first thickness of the first spacer and the second spacer isgreater than a second thickness of the first portion of the main lightblocking portion, and a third thickness of the second portion of themain light blocking portion is less than the second thickness.
 2. Thedisplay device of claim 1, wherein a height from an upper surface of themain light blocking portion to an upper surface of the first and secondspacers is smaller than a distance from the upper surface of the mainlight blocking portion to a surface of the second substrate.
 3. Thedisplay device of claim 2, wherein the furrow is disposed along an edgeof the second spacer.
 4. The display device of claim 3, wherein thefurrow includes a closed curve.
 5. The display device of claim 4,wherein the furrow has a width of about 1 micrometer to about 2micrometers.
 6. The display device of claim 5, wherein the furrow has adepth of about 0.1 micrometer to about 0.3 micrometer from the uppersurface of the first portion of the main light blocking portion.
 7. Thedisplay device of claim 3, wherein the second color filter disposed onthe second thin film transistor has a greater thickness than that of thefirst color filter disposed on the first thin film transistor.
 8. Thedisplay device of claim 7, wherein the light blocking member furtherincludes a third spacer that is disposed on the periphery of the secondthin film transistor and on the second color filter and is connected tothe main light blocking portion, and a height from the upper surface ofthe main light blocking portion to an upper surface of the third spaceris smaller than a distance from the upper surface of the main lightblocking portion to the surface of the second substrate.
 9. The displaydevice of claim 1, wherein a thickness of the second color filterdisposed on the second thin film transistor is greater than that of thefirst color filter disposed on the first thin film transistor.
 10. Thedisplay device of claim 1, wherein the second color filter representsgreen.
 11. The display device of claim 1, further comprising a firstpixel electrode disposed on the first color filter, and a second pixelelectrode disposed on the second color filter.